The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 2005
Filed:
Jul. 11, 2000
Applicants:
Tadayuki Fujiwara, Hiroshima, JP;
Yukiya Wakisaka, Hiroshima, JP;
Masayuki Tooyama, Kanagawa, JP;
Inventors:
Assignee:
Mitsubishi Rayon Co., Ltd., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F007/004 ;
U.S. Cl.
CPC ...
Abstract
The present invention discloses a chemically amplified resist composition comprising: a resin which becomes soluble in an aqueous alkali solution in the presence of an acid, a photo acid generator, and an amine derivative which shows, in water of 25° C., such a basicity as to form a conjugate acid and has a medium polarity. The amine derivative acts as a quencher. Therefore, the chemically amplified resist composition of the present invention enables formation of a very precise and fine resist pattern and can be suitably used particularly in a lithography using an ArF excimer laser beam.