Masayuki Shiina

Title: Masayuki Shiina: Innovator in Plasma Processing Technology

Introduction

Masayuki Shiina is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of plasma processing technology. His innovative work has led to the development of advanced apparatuses and methods that enhance the efficiency of plasma processing.

Latest Patents

Masayuki Shiina holds 2 patents related to plasma processing. His latest patents include a plasma processing apparatus and a plasma processing method. The plasma processing apparatus features a plasma processing chamber where the plasma processing of samples is performed. It includes a plasma power supply that provides radio frequency electric power for generating plasma. The radio frequency electric power is time modulated by a pulse wave with a first period and a second period that are repeated periodically. The pulse wave of the first period has a first amplitude, while the pulse wave of the second period has a second amplitude, which is a limited value smaller than the first amplitude. The extinction of the plasma, generated during the first period, is maintained during the second period with a predetermined dissociation.

Career Highlights

Masayuki Shiina has built a successful career at Hitachi High-Tech Corporation. His work has been instrumental in advancing the company's capabilities in plasma processing technology. His innovative approaches have positioned him as a key figure in the industry.

Collaborations

Masayuki Shiina has collaborated with notable coworkers, including Naoki Yasui and Tetsuo Ono. These collaborations have further enriched his work and contributed to the development of cutting-edge technologies in plasma processing.

Conclusion

Masayuki Shiina's contributions to plasma processing technology exemplify his innovative spirit and dedication to advancing the field. His patents and career achievements reflect his significant impact on the industry.