This inventor holds 1 USPTO granted patent. Top assignee: Kabushiki Kaisha Toshiba. Active years: 2016.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2016
Title: Masayuki Jinguuji: Innovator in Ion Implantation Technology
Introduction
Masayuki Jinguuji is a notable inventor based in Oita, Japan. He has made significant contributions to the field of ion implantation technology, which is crucial for semiconductor manufacturing. His innovative work has led to the development of advanced apparatuses that enhance the efficiency and accuracy of ion implantation processes.
Latest Patents
Masayuki Jinguuji holds a patent for an "Ion implantation apparatus and method of determining state of ion implantation apparatus." This invention includes an ion implantation unit that scans the surface of a substrate with an ion beam containing positively charged ions. The ions are implanted into the substrate, while a position detection unit tracks the scan position of the ion beam. Additionally, the apparatus features a charge supply unit that generates plasma, emits electrons, and supplies them to the substrate. A current value detection unit monitors the current value that varies with the amount of electrons emitted, and a determination unit assesses the charge build-up state of the substrate based on these changes.
Career Highlights
Masayuki Jinguuji has been associated with Kabushiki Kaisha Toshiba, a leading company in technology and electronics. His work at Toshiba has allowed him to focus on developing innovative solutions that address the challenges in the semiconductor industry. His expertise in ion implantation technology has positioned him as a key figure in advancing this critical area of research.
Collaborations
Throughout his career, Masayuki has collaborated with talented individuals such as Kei Hattori and Keiji Fujita. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas, further enhancing the development of new technologies.
Conclusion
Masayuki Jinguuji's contributions to ion implantation technology exemplify the impact of innovative thinking in the semiconductor industry. His patent and work at Toshiba highlight the importance of advancements in this field, paving the way for future developments.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
