Company Filing History:
Years Active: 1995
Title: Masayuki Iwasaski: Innovator in Light Shielding Technology
Introduction
Masayuki Iwasaski is a notable inventor based in Shizuoka, Japan. He has made significant contributions to the field of light shielding technology, particularly through his innovative patent. His work is recognized for its potential applications in various industries, including electronics and imaging.
Latest Patents
Iwasaski holds a patent for a "Method for forming a light shielding pattern." This method involves several steps to create a light shielding pattern on a substrate that has a picture element pattern. The process includes forming a photopolymerizable light shielding material layer, overall exposing from the back of the substrate, and developing the material to form the desired pattern. This innovative approach enhances the precision and efficiency of light shielding in various applications.
Career Highlights
Masayuki Iwasaski is associated with Fuji Photo Film Company, Limited, where he has contributed to advancements in imaging technology. His expertise in photopolymerization and light shielding has positioned him as a valuable asset in his field. His work has implications for improving the quality and functionality of imaging devices.
Collaborations
Iwasaski has collaborated with notable colleagues, including Morimasa Sato and Fumiaki Shinozaki. These collaborations have fostered a creative environment that encourages innovation and the development of new technologies.
Conclusion
Masayuki Iwasaski's contributions to light shielding technology exemplify the impact of innovative thinking in the field of imaging. His patent and work at Fuji Photo Film Company, Limited highlight the importance of advancements in this area. His collaborations further enhance the potential for future innovations.