The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 23, 1995
Filed:
Dec. 17, 1992
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
A method for forming a light shielding pattern on a substrate having a picture element pattern on its front including picture elements which have a single color or plural colors and do not contact each other includes. (1) forming a photopolymerizable light shielding material layer on the front of a substrate having picture element pattern including picture elements having a single color or plural colors, (2) overall exposing from the back of the substrate, (3) exposing the photopolymerizable light shielding material layer through a mask which is light transmissive at portions corresponding to the periphery of the picture elements of the picture element pattern formed on the substrate and at portions at which no picture element is present, (4) developing the photopolymerizable light shielding material to form the light shielding pattern, and (5) subjecting the light shielding pattern formed to a side etching to remove any portion of the light shielding pattern, which overlaps with the picture elements wherein step (2) is carried out after step (1) and before step (5).