Masayuki Endou

Title: Masayuki Endou: Innovator in Light-Sensitive Polymers

Introduction

Masayuki Endou is a notable inventor based in Kadoma, Japan. He has made significant contributions to the field of materials science, particularly in the development of light-sensitive polymers. With a total of 2 patents, his work has implications for various applications in technology and manufacturing.

Latest Patents

Endou's latest patents focus on a polymer that features linear --Si--O--Si-- bonds and --Si--Si--Si-- bonds, or polysilane bonds that exceed trisilane bonds, which are sensitive to far ultraviolet rays. The polymer is synthesized by polymerizing a dichlorosiloxane alone or in combination with at least one dichlorosilane in an inert solvent, utilizing sodium as a catalyst. This innovative polymer undergoes oxidation with oxygen plasma to create SiO₂ that is resistant to oxygen dry etching. It exhibits absorption peaks exclusively in the far ultraviolet spectrum, making it suitable for the preparation of single-layered resists or as an upper resist in a two-layered system.

Career Highlights

Throughout his career, Masayuki Endou has worked with prominent companies such as Matsushita Electric Industrial Co., Ltd. and Shin-Etsu Chemical Co., Ltd. His experience in these organizations has allowed him to refine his expertise in polymer chemistry and materials engineering.

Collaborations

Endou has collaborated with notable colleagues in his field, including Yoshiyuki Tani and Kazufumi Ogawa. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion

Masayuki Endou's innovative work in light-sensitive polymers showcases his significant contributions to materials science. His patents reflect a deep understanding of polymer chemistry and its applications in technology.