Kumamoto, Japan

Masayoshi Takeshita

This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masayoshi Takeshita. Retrieved from https://idiyas.com/inventor/masayoshi-takeshita

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 26(Granted Patents)


Company Filing History:

goldMedal1 out of 834,570 
Other
 patents

Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: Masayoshi Takeshita: Innovator in Plasma Processing Technology

Introduction

Masayoshi Takeshita is a notable inventor based in Kumamoto, Japan. He has made significant contributions to the field of plasma processing technology. His innovative approach has led to the development of a unique method for detecting anomalous discharges in plasma processing equipment.

Latest Patents

Takeshita holds a patent for a "Method and apparatus for detecting anomalous discharge in plasma processing equipment using weakly-ionized thermal non-equilibrium plasma." This patent describes an anomalous arc discharge detection apparatus that utilizes multiple ultrasonic detectors placed at various sections of a plasma processing chamber. The apparatus detects ultrasonic waves accompanying anomalous discharges, allowing for precise monitoring and alarm issuance if necessary. The technology enables the determination of the source point and level of the anomalous discharge through advanced calculations based on delay times.

Career Highlights

Throughout his career, Masayoshi Takeshita has focused on enhancing the safety and efficiency of plasma processing systems. His work has been instrumental in advancing the understanding of plasma behavior and its applications in various industries. He has successfully developed technologies that improve the reliability of plasma processing equipment.

Collaborations

Takeshita has collaborated with Mitsuo Yasaka, contributing to the advancement of their shared research interests in plasma technology. Their partnership has fostered innovation and has led to the development of cutting-edge solutions in the field.

Conclusion

Masayoshi Takeshita's contributions to plasma processing technology exemplify the impact of innovative thinking in engineering. His patent and collaborative efforts continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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