Tokyo, Japan

Masayoshi Otsuka


Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: Masayoshi Otsuka: Innovator in Photosensitive Material Processing

Introduction

Masayoshi Otsuka is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of photosensitive materials, particularly through his innovative patent. His work is recognized for its potential applications in various industries.

Latest Patents

Otsuka holds a patent for an "Apparatus for processing photosensitive material." This invention involves a processing apparatus that features a coating device for applying a processing liquid to a photosensitive material. The apparatus utilizes a slot die with a manifold and a slot inside the die as the coating device. Additionally, it includes a photosensitive material transferring device, a detecting device, and a feedback mechanism to control the operation of the processing liquid supplying device based on detection results.

Career Highlights

Masayoshi Otsuka is associated with Mitsubishi Paper Mills Limited, where he has been able to apply his expertise in developing innovative solutions for processing photosensitive materials. His work has contributed to advancements in the industry, showcasing his commitment to innovation.

Collaborations

Otsuka has collaborated with notable colleagues such as Toshihito Maruyama and Shigeyoshi Suzuki. Their combined efforts have furthered research and development in the field of photosensitive materials.

Conclusion

Masayoshi Otsuka's contributions to the processing of photosensitive materials highlight his innovative spirit and dedication to advancing technology. His patent reflects a significant step forward in the industry, demonstrating the importance of collaboration and creativity in driving progress.

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