Kanagawa, Japan

Masayoshi Okamura

This inventor holds 1 USPTO granted patent. Top assignee: Mitsubishi Gas Chemical Company, Inc.. Active years: 1985.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masayoshi Okamura. Retrieved from https://idiyas.com/inventor/masayoshi-okamura-iiwpc1sf

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 1985

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Masayoshi Okamura: Innovator in Oligoester Production

Introduction

Masayoshi Okamura is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of chemical engineering, particularly in the production of oligoesters. His innovative approach has led to advancements that benefit various industries.

Latest Patents

Masayoshi Okamura holds a patent for a "Process for producing oligoesters." This patent outlines a method for creating oligoesters, which are essential in numerous applications, including plastics and coatings. He has 1 patent to his name, showcasing his expertise in this specialized area.

Career Highlights

Okamura is currently employed at Mitsubishi Gas Chemical Company, Inc., where he continues to develop and refine chemical processes. His work at this esteemed company has allowed him to contribute to significant advancements in chemical production.

Collaborations

Throughout his career, Masayoshi Okamura has collaborated with talented individuals such as Akira Miyamoto and Senzo Shimizu. These partnerships have fostered innovation and have been instrumental in the development of new technologies.

Conclusion

Masayoshi Okamura's contributions to the field of oligoester production highlight his role as a key innovator in chemical engineering. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…