Company Filing History:
Years Active: 2006
Title: Masayoshi Nohira: Innovator in Plasma CVD Technology
Introduction
Masayoshi Nohira is a notable inventor based in Chiba, Japan. He has made significant contributions to the field of semiconductor processing, particularly through his innovative designs in plasma chemical vapor deposition (CVD) technology. His work has been instrumental in enhancing the efficiency and uniformity of thin film applications.
Latest Patents
Masayoshi Nohira holds 1 patent for his invention titled "High density plasma CVD chamber." This patent focuses on the design of a plasma CVD chamber that provides more uniform conditions for forming thin CVD films on a substrate. The apparatus includes a chamber defining a plasma processing region, featuring a bottom, a side wall, and a dome on top. The design incorporates both a top RF coil and a side RF coil, with specific ratios to optimize performance.
Career Highlights
Nohira is currently associated with Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work at Applied Materials has allowed him to push the boundaries of technology in semiconductor manufacturing, contributing to advancements that benefit the industry as a whole.
Collaborations
Throughout his career, Masayoshi Nohira has collaborated with esteemed colleagues such as Sudhir R Gondhalekar and Tom K Cho. These collaborations have fostered an environment of innovation and have led to the development of cutting-edge technologies in the field.
Conclusion
Masayoshi Nohira's contributions to plasma CVD technology exemplify the impact of innovative thinking in the semiconductor industry. His patent and work at Applied Materials, Inc. highlight his role as a key player in advancing semiconductor processing techniques.