Nagoya, Japan

Masayoshi Nakane

This inventor holds 1 USPTO granted patent. Top assignee: Ngk Insulators, Inc.. Active years: 1991.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masayoshi Nakane. Retrieved from https://idiyas.com/inventor/masayoshi-nakane-pkz7fk89

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 1991

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1 patent (USPTO):Explore Patents

Title: Masayoshi Nakane and Die Inspection for Honeycomb Structures.

Introduction

Masayoshi Nakane is an inventor associated with Nagoya, Japan, and NGK Insulators, Inc. His patent work includes a method for inspecting dies used to form honeycomb structures.

Latest Patents

Nakane is credited with 1 patent: “Method of Inspecting Die for Forming Honeycomb Structure.” The method uses diffused light directed onto the die’s slit-side end face. A photosensitive device, such as sensitized paper, detects light that reaches the opposite end after irregular reflection from the inner surfaces of the die’s rear apertures. Bright and dark areas on the device are then used to determine the roughness distribution inside those apertures.

Career Highlights

The patent addresses inspection of dies with narrow slits and numerous rear apertures, components used in forming honeycomb structures. Its optical approach provides a way to assess internal surface roughness through the pattern of reflected light.

Collaborations

Mitsuaki Watanabe is identified as Nakane’s coworker. The available information does not specify their roles or describe a particular joint project.

Conclusion

Masayoshi Nakane’s documented invention applies optical inspection to evaluate the internal surfaces of dies for honeycomb structure production.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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