Nagoya, Japan

Masayoshi Miwa


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2007-2010

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2 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Masayoshi Miwa

Introduction

Masayoshi Miwa is a notable inventor based in Nagoya, Japan. He has made significant contributions to the field of assembly methods and protective coatings for cell structures. With a total of 2 patents, his work showcases innovative solutions that address practical challenges in manufacturing and material protection.

Latest Patents

Miwa's latest patents include an assembling method that utilizes marked information to facilitate the assembly process. This method involves a cell structure housed within a metal vessel, held in place by a compressible material. The assembly process is enhanced by marking the dimensions of both the structure and the vessel, allowing for precise selection and assembly to achieve optimal holding conditions. His second patent focuses on a method for protecting displayed information on the surface of a cell structure. This method involves coating the area surrounding the displayed information to prevent catalyst solutions from exuding, ensuring that the information remains readable and intact.

Career Highlights

Throughout his career, Masayoshi Miwa has worked with prominent companies such as NGK Insulators, Inc. and Honda Giken Kogyo Kabushiki Kaisha. His experience in these organizations has contributed to his expertise in developing innovative assembly methods and protective technologies.

Collaborations

Miwa has collaborated with notable coworkers, including Yukihito Ichikawa and Eiji Ito. Their combined efforts have likely fostered a creative environment that encourages innovation and problem-solving.

Conclusion

Masayoshi Miwa's contributions to the field of invention, particularly in assembly methods and protective coatings, highlight his innovative spirit and dedication to advancing technology. His patents reflect a commitment to improving manufacturing processes and ensuring the longevity of critical information on cell structures.

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