Masayoshi Hino

Title: Masayoshi Hino: Innovator in Ion Implantation Technology

Introduction

Masayoshi Hino is a prominent inventor based in Kyoto, Japan, known for his significant contributions to the field of ion implantation technology. With a total of five patents to his name, Hino has made remarkable advancements that enhance the efficiency and precision of semiconductor manufacturing processes.

Latest Patents

Hino's latest patents include a wafer handling method and an ion implanter. The ion implanter is designed to perform ion implantation by irradiating a wafer, which has a notch at its outer peripheral region, with an ion beam. This innovative device features a twist angle adjustment mechanism to fine-tune the twist angle, an aligner for adjusting the alignment angle, and a wafer transfer device that facilitates the movement of the wafer between the aligner and the twist angle adjustment mechanism. Additionally, an image processing device detects the twist angle of the wafer, while a control device executes a twist control process based on the differences between the detected twist angle, alignment angle, and a target twist angle.

Another notable patent is the ion implantation method and apparatus that allows for the formation of a circular implantation region and a surrounding peripheral implantation region with varying dose amounts. This method eliminates the need for step rotation of the substrate, instead varying the scanning speed of the ion beam across the substrate's surface based on its position.

Career Highlights

Masayoshi Hino has dedicated his career to advancing ion implantation technology, working at Nissin Ion Equipment Co., Ltd. His expertise in this field has led to the development of innovative solutions that improve the performance and capabilities of ion implantation systems.

Collaborations

Hino collaborates with talented colleagues, including Kohei Tanaka and Takashi Nogami, who contribute to the research and development efforts at Nissin Ion Equipment Co., Ltd. Their combined expertise fosters a collaborative environment that drives innovation in semiconductor technology.

Conclusion

Masayoshi Hino's contributions to ion implantation technology have significantly impacted the semiconductor industry. His innovative patents and collaborative efforts continue to push the boundaries of what is possible in this field.