This inventor holds 2 USPTO granted patents. Top assignee: Nissin Electric Co., Ltd.. Active years: 1993-2000.
Company Filing History:
Years Active: 1993-2000
Title: Masayasu Tanjyo: Innovator in Ion Beam Technology
Introduction
Masayasu Tanjyo is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of ion beam technology, holding a total of 2 patents. His work focuses on methods and apparatuses that enhance the efficiency and effectiveness of ion beams.
Latest Patents
Tanjyo's latest patents include a "Method and apparatus for deflecting charged particles" and an "Ion source having a mass separation device." The first patent describes a large-area ion beam generated in a magnetically shielded ion source. This ion beam is bent to form a large center angle of about 90 degrees using a specialized magnet. The design allows for the removal of unnecessary ions through a slit plate, ensuring that the ion beam can effectively target subjects in motion. The second patent outlines an ion source designed to produce wide, large-area ion beams equipped with a mass-separation device. This device utilizes multiple electrode plates and Wien filters to separate ion beams by mass, resulting in high-purity ion beams with low kinetic energy.
Career Highlights
Masayasu Tanjyo is currently employed at Nissin Electric Co., Ltd., where he continues to innovate in the field of ion beam technology. His work has been instrumental in advancing the capabilities of ion sources and their applications in various industries.
Collaborations
Throughout his career, Tanjyo has collaborated with notable colleagues, including Hiroshi Nakazato and Masahiko Aoki. These partnerships have contributed to the development of cutting-edge technologies in ion beam applications.
Conclusion
Masayasu Tanjyo's contributions to ion beam technology through his patents and collaborations highlight his role as a leading inventor in this specialized field. His innovative approaches continue to influence advancements in ion beam applications.