Company Filing History:
Years Active: 2015
Title: Masaya Ookawa: Innovator in Photosensitive Resin Technology
Introduction
Masaya Ookawa is a notable inventor based in Kamisu, Japan. He has made significant contributions to the field of materials science, particularly in the development of photosensitive resin compositions.
Latest Patents
Masaya Ookawa holds a patent for a photosensitive resin composition designed for protective films of printed wiring boards used in semiconductor packages. This innovative composition includes an acid-modified vinyl group-containing epoxy resin, a phenol compound, a compound with at least one ethylenically unsaturated group, a photopolymerization initiator, and inorganic fine particles. This patent showcases his expertise in creating advanced materials that enhance the performance and reliability of electronic components.
Career Highlights
Masaya Ookawa is associated with Hitachi Chemical Company, Ltd., where he has been instrumental in advancing the company's research and development efforts. His work has contributed to the enhancement of semiconductor packaging technologies, which are crucial for modern electronics.
Collaborations
Throughout his career, Masaya Ookawa has collaborated with esteemed colleagues such as Kazuhiko Kurafuchi and Toshizumi Yoshino. These partnerships have fostered innovation and have led to the successful development of new materials and technologies.
Conclusion
Masaya Ookawa's contributions to the field of photosensitive resin technology highlight his role as a key innovator in the semiconductor industry. His work continues to influence advancements in electronic materials, ensuring the ongoing evolution of technology.