Location History:
- Amagasaki, JP (2005)
- Sakai, JP (2005 - 2014)
- Osaka, JP (2001 - 2016)
- Tokyo, JP (2015 - 2017)
Company Filing History:
6 out of 530 
3 out of 19 
2 out of 1,787 
Years Active: 2001-2017
Title: The Innovations of Masatoshi Yamaoka
Introduction
Masatoshi Yamaoka is a prominent inventor based in Sakai, Japan. He has made significant contributions to the field of technology, particularly in the area of wafer inspection systems. With a total of 14 patents to his name, Yamaoka's work has had a substantial impact on the industry.
Latest Patents
Yamaoka's latest patents include innovative systems and methods for detecting defects on a wafer. One of his notable inventions is the "Array Mode Repeater Detection," which involves generating test images for portions of an array region in dies on a wafer. This method utilizes frame images produced by scanning the wafer with an inspection system. Additionally, it generates reference images for cells in the array region and determines difference images by subtracting the reference image from the test images. This process allows for the effective detection of defects on the wafer.
Another significant patent is the "Repeater Detection," which follows a similar methodology. It also focuses on generating test images and reference images to identify defects in the wafer. These advancements demonstrate Yamaoka's commitment to improving wafer inspection technology.
Career Highlights
Throughout his career, Masatoshi Yamaoka has worked with notable companies, including Konami Digital Entertainment Co., Ltd. and Konami Computer Entertainment Osaka, Inc. His experience in these organizations has contributed to his expertise in the field.
Collaborations
Yamaoka has collaborated with several talented individuals, including Kazuhiro Namba and Norio Nakayama. These partnerships have likely enhanced his innovative capabilities and led to the development of groundbreaking technologies.
Conclusion
Masatoshi Yamaoka's contributions to the field of wafer inspection technology are noteworthy. His patents reflect a deep understanding of the complexities involved in detecting defects on wafers. Through his work, he continues to influence advancements in the industry.