Koshigaya, Japan

Masatoshi Tomiki

This inventor holds 4 USPTO granted patents, plus 1 CIPO patent. Top assignee: Somar Corporation. Active years: 1991-1994.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masatoshi Tomiki. Retrieved from https://idiyas.com/inventor/masatoshi-tomiki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 3

Forward Citations = 36(Granted Patents)


Company Filing History:


Years Active: 1991-1994

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4 patents (USPTO):Explore Patents

Title: Masatoshi Tomiki: Innovator in Photosensitive Coatings

Introduction

Masatoshi Tomiki is a notable inventor based in Koshigaya, Japan. He has made significant contributions to the field of photosensitive coatings, holding a total of 4 patents. His work has been instrumental in advancing technologies related to coating compositions.

Latest Patents

Tomiki's latest patents include a composition for forming a photosensitive coating. This innovative composition features O-naphthoquinone diazide, which is essential for creating effective photosensitive materials. Another notable patent involves a matted film that consists of a synthetic resin film and a mat layer. This layer contains a matting agent made from a mixture of organic and inorganic fillers, enhancing the film's properties.

Career Highlights

Throughout his career, Masatoshi Tomiki has worked with reputable companies such as Somar Corporation and Ryohei Ehara. His experience in these organizations has allowed him to refine his expertise in the development of advanced coating technologies.

Collaborations

Tomiki has collaborated with several professionals in his field, including Shinichi Yamamoto and Naohiko Kiryu. These partnerships have contributed to the success of his projects and innovations.

Conclusion

Masatoshi Tomiki's contributions to the field of photosensitive coatings demonstrate his innovative spirit and dedication to advancing technology. His patents and collaborations reflect his significant impact on the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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