Kawasaki, Japan

Masatoshi Terayama

This inventor holds 2 USPTO granted patents and 2 published patent applications. Top assignee: Kioxia Corporation. Active years: 2023-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masatoshi Terayama. Retrieved from https://idiyas.com/inventor/masatoshi-terayama-j86rx6ts

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2023-2024

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2 patents (USPTO):Explore Patents

Title: Masatoshi Terayama: Innovator in Substrate Processing Technology

Introduction

Masatoshi Terayama is a notable inventor based in Kawasaki, Japan. He has made significant contributions to the field of substrate processing technology. With a total of 2 patents, Terayama's work focuses on improving the efficiency and effectiveness of substrate cleaning and drying processes.

Latest Patents

Terayama's latest patents include a substrate processing apparatus and method designed for cleaning and drying substrates. This innovative apparatus supplies a cleaning liquid onto the substrate to form a cleaning liquid layer. It then introduces a gas to partially remove this layer, creating a first dry region on the substrate. By controlling the movement speed of the boundary between the cleaning liquid layer and the first dry region, the apparatus expands this region to generate a second dry region. Further control allows for the creation of a third dry region, enhancing the overall cleaning and drying process.

Career Highlights

Masatoshi Terayama is currently employed at Kioxia Corporation, where he continues to develop advanced technologies in substrate processing. His expertise and innovative approach have positioned him as a key figure in his field.

Collaborations

One of Terayama's notable collaborators is Minako Inukai. Together, they work on advancing substrate processing technologies, contributing to the ongoing development of efficient manufacturing processes.

Conclusion

Masatoshi Terayama's contributions to substrate processing technology highlight his innovative spirit and dedication to improving industrial processes. His patents reflect a commitment to enhancing efficiency in substrate cleaning and drying, making a significant impact in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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