Company Filing History:
Years Active: 2011
Title: Masatoshi Sato: Innovator in Plasma CVD Technology
Introduction
Masatoshi Sato is a prominent inventor based in Sammu, Japan. He is known for his innovative contributions to the field of plasma chemical vapor deposition (CVD) technology. His work has significantly advanced the quality and efficiency of film deposition processes.
Latest Patents
Masatoshi Sato holds a patent for a "Winding type plasma CVD apparatus." The objective of this invention is to provide a winding type plasma CVD apparatus that ensures uniform quality of a layer by supplying a reaction gas uniformly to the deposition area of a film. This apparatus also performs a self-cleaning process of the deposition portion in the path of deposition onto the film. The film is supported between a pair of movable rollers arranged on the upstream and downstream sides of the deposition portion. The film travels substantially linearly at the deposition position, maintaining a constant distance between a shower plate and the film, which results in a homogeneous layer quality. The film is heated by a metal belt traveling simultaneously on the back side of the film. The movable rollers ascend from the deposition position to the self-cleaning position, allowing the film to be separated from the shower plate. Self-cleaning is achieved by closing the aperture of a mask with a shutter, preventing leakage of cleaning gas.
Career Highlights
Masatoshi Sato is associated with Ulvac, Inc., a company known for its advanced vacuum technology and equipment. His work at Ulvac has positioned him as a key player in the development of innovative deposition technologies.
Collaborations
Some of his notable coworkers include Takayoshi Hirono and Isao Tada, who have collaborated with him on various projects within the field of plasma CVD technology.
Conclusion
Masatoshi Sato's contributions to the field of plasma CVD technology have made a significant impact on the industry. His innovative patent for a winding type plasma CVD apparatus exemplifies his commitment to enhancing film deposition processes.