Company Filing History:
2 out of 10 
1 out of 244 
1 out of 197 
Years Active: 1984-2024
Title: Masatoshi Nakamura: Innovator in Flow Rate Control Technology
Introduction
Masatoshi Nakamura is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of flow rate control technology, holding a total of 4 patents. His innovative designs focus on improving the efficiency and accuracy of fluid flow management systems.
Latest Patents
Nakamura's latest patents include a flow rate control device designed to suppress overshoot while enhancing responsiveness during flow rate adjustments. This device features a flow rate meter that measures the fluid's flow rate, a regulating valve that controls the flow, and a control unit that adjusts the valve's opening based on the meter's readings. The device incorporates a low flow rate rapid valve opening function, which accelerates fluid outflow by quickly opening the valve from a fully closed position. Additionally, it has an overshoot suppressing function that delays flow rate control until a preset time or flow rate threshold is reached. Another patent focuses on improving accumulated flow rate error, featuring a closing function that controls the valve's opening based on instantaneous flow rate values and an accumulated value prediction function that monitors the valve's current state.
Career Highlights
Throughout his career, Masatoshi Nakamura has worked with notable companies such as Toflo Corporation and Mitsui Engineering and Shipbuilding Company Limited. His experience in these organizations has allowed him to refine his expertise in flow rate control technologies and contribute to various innovative projects.
Collaborations
Nakamura has collaborated with talented individuals in his field, including Fumikazu Tamura and Shinji Tobimatsu. These partnerships have fostered a creative environment that has led to the development of advanced flow rate control solutions.
Conclusion
Masatoshi Nakamura's work in flow rate control technology exemplifies his commitment to innovation and efficiency. His patents reflect a deep understanding of fluid dynamics and a dedication to improving industrial applications. His contributions continue to influence the field and inspire future advancements.