The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 10, 2023
Filed:
May. 08, 2023
Toflo Corporation, Tokyo, JP;
Fumikazu Tamura, Tokyo, JP;
Shinji Tobimatsu, Tokyo, JP;
Masatoshi Nakamura, Tokyo, JP;
Kenji Yamamoto, Tokyo, JP;
TOFLO CORPORATION, Tokyo, JP;
Abstract
Provided is a flow rate control device capable of improving accumulated flow rate error. The flow rate control device of the present disclosure includes: a flow rate meter that measures a flow rate of a fluid flowing through a flow path; a flow rate regulating valve that regulates the flow rate of the fluid flowing through the flow path; and a control part that controls an opening degree of the flow rate regulating valve based on a measurement result of the flow rate meter, includes: a closing function that controls the opening degree of the flow rate regulating valve with an instantaneous flow rate value and closes with a set accumulated flow rate value; and an accumulated value prediction function that monitors the current opening degree of the flow rate regulating valve and the instantaneous flow rate value all the time, and starts a closing operation of the flow rate regulating valve at a time point when the accumulated flow rate value reaches an early closing flow rate value.