Fuji, Japan

Masatoshi Matsuoka

This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignee: Polyplastics Co., Ltd.. Active years: 1986.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masatoshi Matsuoka. Retrieved from https://idiyas.com/inventor/masatoshi-matsuoka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 1986

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1 patent (USPTO):Explore Patents

Title: Masatoshi Matsuoka: Innovator in Polyester Resin Technology

Introduction

Masatoshi Matsuoka is a notable inventor based in Fuji, Japan. He has made significant contributions to the field of materials science, particularly in the development of polyester resin compositions. His work has implications for various industries, including manufacturing and materials engineering.

Latest Patents

Matsuoka holds a patent for a polyester resin composition that is resistant to discoloration by light. This innovation addresses a common issue in materials exposed to sunlight, enhancing the durability and aesthetic longevity of products made from this resin.

Career Highlights

Matsuoka is associated with Polyplastics Co., Ltd., a company known for its advancements in plastic materials. His role at the company has allowed him to focus on research and development, leading to his successful patent.

Collaborations

Matsuoka has worked alongside talented colleagues, including Yukio Ikenaga and Osamu Matsuno. Their collaborative efforts have contributed to the innovative environment at Polyplastics Co., Ltd.

Conclusion

Masatoshi Matsuoka's contributions to polyester resin technology exemplify the impact of innovation in materials science. His patent for a light-resistant resin composition showcases his commitment to enhancing product quality and durability.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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