Masato Saito

Title: Masato Saito: Innovator in Lithographic Technology

Introduction

Masato Saito is a prominent inventor based in Fukushima, Japan. He has made significant contributions to the field of lithographic technology, particularly in the development of advanced patterning methods. With a total of 2 patents to his name, Saito's work has garnered attention for its innovative approaches to improving patterning processes.

Latest Patents

Saito's latest patents include a "Pattern forming method with selective silylation utilizing lithographic" and a "Lithographic double-coated patterning plate with undercoat levelling." Both patents propose improvements in double-coated patterning plates, which consist of a substrate, an undercoat levelling layer, and a photoresist layer. Unlike conventional methods that use poly(methyl methacrylate) resin for the undercoat levelling layer, Saito's inventions utilize a copolymeric resin of methyl methacrylate and glycidyl methacrylate. This unique resin composition, when admixed with 2,2',4,4'-tetrahydroxybenzophenone, effectively prevents intermixing between the undercoat levelling layer and the photoresist layer, resulting in enhanced properties for the patterned resist layer.

Career Highlights

Masato Saito is currently employed at Tokyo Ohka Kogyo Co., Ltd., a company known for its advancements in chemical products for the semiconductor industry. His work at the company has been instrumental in pushing the boundaries of lithographic technology.

Collaborations

Saito has collaborated with notable coworkers, including Taku Nakao and Hiroyuki Yamazaki. Their combined expertise has contributed to the successful development of innovative solutions in the field.

Conclusion

Masato Saito's contributions to lithographic technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in patterning methods, showcasing the importance of innovation in technology.