This inventor holds 1 USPTO granted patent. Top assignee: Toyo Boseki Kabushiki Kaisha. Active years: 1998.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1998
Title: Masashi Oki: Innovator in Layered Polyamide Film Technology
Introduction
Masashi Oki is a notable inventor based in Ohtsu, Japan. He has made significant contributions to the field of materials science, particularly in the development of layered polyamide films. His innovative work has led to the creation of a patented technology that enhances the properties of polyamide substrates.
Latest Patents
Masashi Oki holds a patent for a layered polyamide film and the method for producing it. This film includes a polyamide substrate and an adhesiveness-improving layer on at least one surface of the substrate. The adhesiveness-improving layer consists of a graft copolymer of a polyester and an acrylic polymer. Additionally, the film can include a printing ink layer, an adhesive layer, and a sealant layer that are sequentially laminated on the adhesiveness-improving layer. The method for producing this film involves applying an aqueous dispersion of the graft copolymer to the polyamide substrate to form the adhesiveness-improving layer.
Career Highlights
Masashi Oki is associated with Toyo Boseki Kabushiki Kaisha, where he has been instrumental in advancing the company's research and development efforts. His work has not only contributed to the company's portfolio but has also positioned it as a leader in innovative materials.
Collaborations
Masashi Oki has collaborated with notable colleagues such as Chikao Morishige and Yoshinori Nakae. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies.
Conclusion
Masashi Oki's contributions to the field of layered polyamide films exemplify the impact of innovation in materials science. His patented technology represents a significant advancement that enhances the functionality of polyamide substrates.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile