Chiba, Japan

Masashi Ohshima

This inventor holds 1 USPTO granted patent. Top assignee: Fujikura Limited. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masashi Ohshima. Retrieved from https://idiyas.com/inventor/masashi-ohshima-2sg0oyrz

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Masashi Ohshima: Innovator in Cleaning Technology

Introduction

Masashi Ohshima is a notable inventor based in Chiba, Japan. He has made significant contributions to the field of cleaning technology. His innovative approach has led to the development of a unique cleaning tool that enhances efficiency and usability.

Latest Patents

Masashi Ohshima holds a patent for a cleaning tool that features a head and a cleaning body wrapped around the head. The head consists of a head body and a projection that can retract relative to the head body. Additionally, the head may include an elastic member that restores the positional relationship between the projection and the head body. This invention showcases his commitment to improving everyday cleaning tasks.

Career Highlights

Ohshima is currently employed at Fujikura Limited, a company known for its advancements in technology and innovation. His work at Fujikura has allowed him to focus on developing practical solutions that address common challenges in cleaning.

Collaborations

Masashi Ohshima has collaborated with talented coworkers such as Shunsuke Fujita and Kunihiko Fujiwara. Their combined expertise contributes to the innovative environment at Fujikura Limited.

Conclusion

Masashi Ohshima's contributions to cleaning technology exemplify the spirit of innovation. His patented cleaning tool reflects his dedication to enhancing user experience and efficiency in everyday tasks. His work continues to inspire advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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