Otsu, Japan

Masaru Nampei

This inventor holds 3 USPTO granted patents. Top assignee: Toyo Boseki Kabushiki Kaisha. Active years: 1998-2002.


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Location History:

  • Ootsu, JP (1998)
  • Ohtsu, JP (2000 - 2002)

Company Filing History:


Years Active: 1998-2002

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3 patents (USPTO):Explore Patents

Title: Masaru Nampei: Innovator in Photosensitive Resin Technology

Introduction

Masaru Nampei is a notable inventor based in Ohtsu, Japan. He has made significant contributions to the field of photosensitive resin technology, holding a total of 3 patents. His work focuses on improving processes related to the treatment of unexposed photosensitive resin plates.

Latest Patents

One of his latest patents is a process for treating the periphery of unexposed photosensitive resin plates. This innovative process involves the irradiation of light with a wavelength of not longer than 300 nm on the periphery of the unexposed photosensitive resin plate until the periphery is free of stickiness. The invention addresses several issues, including the sticking of peripheral resin to packages, unexposed resin to working tables, exposure tables, or vacuum adhesion sheets, and the accumulation of dust on the periphery of unexposed plates. Additionally, it prevents unexposed resin from sticking to hands during handling, thereby eliminating defects in the handling process during the production of printing plates.

Career Highlights

Masaru Nampei is associated with Toyo Boseki Kabushiki Kaisha, where he continues to develop and refine his innovative processes. His work has had a significant impact on the efficiency and effectiveness of printing plate production.

Collaborations

Throughout his career, Nampei has collaborated with notable colleagues, including Katsumasa Yamamoto and Takamitsu Ariki. These collaborations have further enhanced the development of his patented technologies.

Conclusion

Masaru Nampei's contributions to the field of photosensitive resin technology demonstrate his commitment to innovation and improvement in manufacturing processes. His patents reflect a deep understanding of the challenges faced in the industry and provide effective solutions to enhance productivity and quality.

Profile summary based on public USPTO records.
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