Masaru Matsuzaki

Title: Masaru Matsuzaki: Innovator in Plasma Processing Technology

Introduction

Masaru Matsuzaki is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 4 patents. His work has been instrumental in advancing the efficiency and effectiveness of plasma processing apparatuses.

Latest Patents

Matsuzaki's latest patents include a plasma processing apparatus and method for venting a processing chamber to the atmosphere. This innovative apparatus features a processing chamber where plasma processing is performed on a wafer. It includes a device that reduces pressure in the processing chamber through an evacuating pipe, ensuring a high degree of vacuum. Additionally, the apparatus incorporates a heat-transfer gas flow channel that effectively transfers heat from the stage to the wafer. A first gas supplying mechanism is also included, which supplies gas to the evacuating pipe during the venting process, controlled by a sophisticated control device.

Career Highlights

Throughout his career, Matsuzaki has worked with notable companies such as Hitachi High-Tech Corporation and Morinaga Milk Industry Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking innovations in plasma processing technology.

Collaborations

Matsuzaki has collaborated with esteemed colleagues, including Kazuyuki Ikenaga and Shigeo Okonogi. These partnerships have fostered a creative environment that has led to the development of advanced technologies in their field.

Conclusion

Masaru Matsuzaki's contributions to plasma processing technology highlight his innovative spirit and dedication to advancing the industry. His patents and collaborations reflect a commitment to excellence and a drive to push the boundaries of what is possible in technology.