Numazu, Japan

Masaru Endoh

This inventor holds 1 USPTO granted patent. Top assignee: Fujitsu Corporation. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masaru Endoh. Retrieved from https://idiyas.com/inventor/masaru-endoh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Masaru Endoh: Innovator in Observation Systems

Introduction

Masaru Endoh is a notable inventor based in Numazu, Japan. He has made significant contributions to the field of observation systems, showcasing his innovative spirit through his patented inventions. His work is particularly recognized for its practical applications in technology.

Latest Patents

Masaru Endoh holds a patent for an "Observation system and observation method." This system includes a first sensor designed to observe a first portion of an observation target and a second sensor for observing a second portion. The control device, which comprises a memory and a processor, is configured to receive observation data from both sensors through relay devices. Notably, the system ensures that observation data is not transmitted between sensors when it is being sent to the control device, enhancing the efficiency of data processing.

Career Highlights

Endoh is currently associated with Fujitsu Corporation, a leading technology company known for its innovative solutions. His role at Fujitsu has allowed him to work on cutting-edge technologies and contribute to advancements in observation systems.

Collaborations

Throughout his career, Masaru Endoh has collaborated with esteemed colleagues such as Hiroshi Muramatsu and Koichi Takaba. These collaborations have fostered a creative environment that encourages innovation and the development of new technologies.

Conclusion

Masaru Endoh's contributions to observation systems exemplify his dedication to innovation and technology. His patent reflects a significant advancement in the field, and his work continues to influence the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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