Setagaya, Japan

Masao Tanaka

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Metex Corporation. Active years: 2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masao Tanaka. Retrieved from https://idiyas.com/inventor/masao-tanaka-geae9wb1

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank


Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: Innovations by Masao Tanaka in Ear Covering Technology

Introduction

Masao Tanaka is a notable inventor based in Setagaya-ku, Japan. He has made significant contributions to the field of wearable technology, particularly with his innovative designs for ear coverings. His work reflects a blend of functionality and comfort, aimed at enhancing user experience.

Latest Patents

Tanaka holds a patent for an ear covering and its manufacturing method. This invention involves a unique process of sewing first and second cloth layers together along a closed-loop seam. The design includes a hole that extends through both layers, allowing for a flexible insert shaped like a distorted, truncated cone. The assembly is turned inside out to create a cup-shaped receptacle that comfortably receives the external ear, ensuring that the seams are positioned for optimal comfort and aesthetics.

Career Highlights

Masao Tanaka is associated with Metex Corporation, where he continues to innovate and develop new products. His work at the company has been instrumental in advancing the design and functionality of ear coverings, making them more accessible and user-friendly.

Collaborations

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Conclusion

Masao Tanaka's contributions to ear covering technology exemplify the spirit of innovation in wearable design. His patent showcases a thoughtful approach to comfort and usability, marking him as a significant figure in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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