Masao Nakamura

Title: Masao Nakamura: Innovator in Photosensitive Technology

Introduction

Masao Nakamura is a notable inventor based in Machida, Japan. He has made significant contributions to the field of photosensitive materials, holding a total of 6 patents. His work has advanced the technology used in various imaging applications.

Latest Patents

Nakamura's latest patents include a method of irradiating photosensitive material with a laser beam. This method involves forming dots on a photosensitive material by using a laser beam with specific pulse width and energy density parameters. Another significant patent is for a film data exposure device, which is designed to form a latent image of identification data on a new photosensitive film. This apparatus includes an editing unit, a memory for storing data, and an exposure unit that synchronizes with the feeding of the photosensitive film.

Career Highlights

Throughout his career, Masao Nakamura has worked with prominent companies such as Konica Corporation and Konishiroku Photo Industry Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to innovative projects in the field of imaging technology.

Collaborations

Nakamura has collaborated with notable coworkers, including Kenji Yamanouchi and Makoto Ikeda. Their combined expertise has fostered advancements in the development of photosensitive materials and related technologies.

Conclusion

Masao Nakamura's contributions to the field of photosensitive technology are significant and impactful. His innovative patents and collaborations highlight his role as a key figure in advancing imaging technology.