Location History:
- Yokohama, JP (1998 - 2000)
- Kanagawa, JP (2001)
Company Filing History:
Years Active: 1998-2001
Title: Masao Higeta: Innovator in Sputtering Technology
Introduction
Masao Higeta is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of materials science, particularly in the development of sputtering targets and transparent conductive films. With a total of 3 patents to his name, Higeta continues to push the boundaries of innovation in his industry.
Latest Patents
Higeta's latest patents include a process for producing sputtering targets. This process involves molding a mixture of a high-melting substance with a low-melting metal at a temperature below the melting point of the latter, under heat and pressure. Another notable patent is for a transparent conductive film of a zinc oxide type that contains gallium and silicon. This film is designed to include silicon in an amount ranging from 0.01 to 1.5 mol % in terms of SiO₂.
Career Highlights
Masao Higeta is currently employed at Asahi Glass Company, Limited, where he applies his expertise in materials science to develop innovative solutions. His work has been instrumental in advancing the technology used in various applications, particularly in electronics and optics.
Collaborations
Higeta has collaborated with notable colleagues, including Atsushi Hayashi and Akira Mitsui. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.
Conclusion
Masao Higeta's contributions to the field of materials science exemplify the spirit of innovation. His patents and collaborative efforts continue to influence the industry, paving the way for future advancements.