The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 19, 2001
Filed:
Dec. 12, 1997
Applicant:
Inventors:
Assignee:
Asahi Glass Company Ltd., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
B22F 3/14 ;
U.S. Cl.
CPC ...
B22F 3/14 ;
Abstract
A process for producing sputtering targets, which comprises molding a mixture of a powder of a high-melting substance having a melting point of 900° C. or above with a powder of a low-melting metal having a melting point of 700° C. or below at a temperature below the melting point of the low-melting metal under heat and pressure.