This inventor holds 1 USPTO granted patent. Top assignee: Vlsi Technology Research Association. Active years: 1981.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1981
Title: The Innovations of Masanobu Kohda
Introduction: Masanobu Kohda is a notable inventor based in Kawasaki, Japan. He has made significant contributions to the field of materials science, particularly in the development of radiation-sensitive positive resists. His work has implications for various applications in semiconductor manufacturing and photolithography.
Latest Patents: Masanobu Kohda holds 1 patent for a radiation-sensitive positive resist. This innovative resist is prepared from a homogeneous polymer derived from halogenated alkyl α-halogenated acrylate. The general structural formula for this resist includes halogens such as fluorine, chlorine, or bromine, which enhance its performance in radiation applications.
Career Highlights: Kohda has been associated with the VLSI Technology Research Association, where he has contributed to advancing technology in the semiconductor industry. His expertise in polymer chemistry and materials science has positioned him as a key figure in his field.
Collaborations: Throughout his career, Masanobu Kohda has worked alongside esteemed colleagues such as Tsukasa Tada and Hideo Saeki. Their collaborative efforts have furthered research and development in innovative materials.
Conclusion: Masanobu Kohda's contributions to the field of radiation-sensitive materials exemplify the importance of innovation in technology. His work continues to influence advancements in semiconductor manufacturing and related industries.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile