Otake, Japan

Masanari Nishimura

This inventor holds 2 USPTO granted patents and 9 published patent applications and 1 EPO patent. Top assignee: Mitsubishi Chemical Corporation. Active years: 2020-2025.

USPTO Granted Patents = 2 

% Patents Active = 100.0

 

Average Co-Inventor Count = 5.5

ph-index = 1


Company Filing History:


Years Active: 2020-2025

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2 patents (USPTO):Explore Patents

Title: Masanari Nishimura: Innovator in Polymer Technology

Introduction

Masanari Nishimura is a prominent inventor based in Otake, Japan. He has made significant contributions to the field of polymer technology, particularly in the development of copolymers that suppress protein adsorption. His innovative work has led to the filing of multiple patents, showcasing his expertise and dedication to advancing material science.

Latest Patents

Masanari Nishimura holds 2 patents that focus on the creation and application of specialized copolymers. His latest patents include a copolymer designed to suppress protein adsorption, which is crucial for producing articles that come into contact with proteins. This copolymer contains specific constitutional units that enhance its functionality. Additionally, he has developed a production method for a polymer that exhibits exceptional resistance to dwell-induced degradation, along with a molded article that boasts low haze value and remarkable pliability.

Career Highlights

Nishimura is affiliated with Mitsubishi Chemical Corporation, where he has been instrumental in advancing polymer research and development. His work has not only contributed to the company's portfolio but has also positioned him as a key figure in the field of material innovation.

Collaborations

Throughout his career, Masanari Nishimura has collaborated with notable colleagues, including Taeko Oonuma and Tetsuya Noda. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and enhances the quality of their research.

Conclusion

Masanari Nishimura's contributions to polymer technology and his innovative patents reflect his commitment to advancing the field. His work continues to influence the development of materials that are essential in various applications.

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