Osaka, Japan

Masanao Miyoshi

This inventor holds 1 USPTO granted patent and 4 published patent applications. Top assignees: Bonset America Corporation, C.i. Takiron Corporation. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masanao Miyoshi. Retrieved from https://idiyas.com/inventor/masanao-miyoshi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Masanao Miyoshi: Innovator in Polyester-Based Shrink Film

Introduction

Masanao Miyoshi is a notable inventor based in Osaka, Japan. He is recognized for his contributions to the field of materials science, particularly in the development of polyester-based shrink films. His innovative work has led to advancements that enhance the performance and durability of these materials.

Latest Patents

Miyoshi holds a patent for a polyester-based shrink film. This film is characterized by its excellent predetermined impact resistance and a uniform shrinkage ratio near the shrinking temperature. His invention addresses critical needs in various applications, making it a valuable asset in the industry.

Career Highlights

Throughout his career, Masanao Miyoshi has worked with prominent companies, including C.I. Takiron Corporation and Bonset America Corporation. His experience in these organizations has allowed him to refine his skills and contribute significantly to the development of innovative materials.

Collaborations

Miyoshi has collaborated with talented individuals such as Takuma Kaneko and Yuichiro Kanzaka. These partnerships have fostered a creative environment that has led to the successful development of new technologies and products.

Conclusion

Masanao Miyoshi's work in polyester-based shrink films exemplifies the impact of innovation in materials science. His contributions continue to influence the industry, showcasing the importance of research and development in creating advanced solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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