Company Filing History:
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Years Active: 1998-2010
Title: Masamichi Kamiyama: Innovator in Semiconductor Technology
Introduction
Masamichi Kamiyama is a notable inventor based in Kawasaki, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on enhancing the performance and reliability of semiconductor devices.
Latest Patents
One of Kamiyama's latest patents is for a semiconductor device with crack-resistant multilayer copper wiring. This invention includes a multilayer pad that comprises a first pad layer over a semiconductor substrate, featuring a first copper wiring region and an intralayer insulating region. Additionally, a second pad layer is provided over the first pad layer, ensuring that all regions are covered with copper wiring when viewed from above. Another significant patent is a timing analysis method and apparatus, which evaluates the performance of a target circuit. This method calculates a correlation coefficient between macro cells and carries out a statistical timing analysis based on the correlation and distribution functions of delay times.
Career Highlights
Kamiyama has worked with prominent companies in the semiconductor industry, including Fujitsu Semiconductor Limited and Fujitsu Corporation. His experience in these organizations has allowed him to develop innovative solutions that address critical challenges in semiconductor design and manufacturing.
Collaborations
Some of his notable coworkers include Masashi Takase and Takanori Watanabe. Their collaborative efforts have contributed to advancements in semiconductor technologies.
Conclusion
Masamichi Kamiyama's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the field. His work continues to impact the industry positively.