Kokubunji, Japan

Masami Tomono


Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 31(Granted Patents)


Company Filing History:


Years Active: 1977

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1 patent (USPTO):Explore Patents

Title: Masami Tomono: Innovator in Discrete Semiconductor Devices

Introduction

Masami Tomono is a notable inventor based in Kokubunji, Japan. He has made significant contributions to the field of semiconductor technology. His work focuses on the development of discrete semiconductor devices, which are essential components in various electronic applications.

Latest Patents

Masami Tomono holds a patent for a discrete semiconductor device that utilizes polymer resin as an insulator. The patent describes a discrete semiconductor device comprising a silicon body with an emitter region, a base region, and a collector region. It features a silicon dioxide layer on the surface of the body, along with a polyimide resin layer that has a thickness of 5 micrometers. The design includes electrodes that penetrate through both the silicon dioxide layer and the polyimide resin, allowing for easy wire bonding to external electrodes.

Career Highlights

Masami Tomono is associated with Hitachi, Ltd., a leading company in technology and electronics. His work at Hitachi has allowed him to contribute to advancements in semiconductor devices, enhancing their performance and reliability.

Collaborations

Throughout his career, Masami Tomono has collaborated with esteemed colleagues, including Akira Abe and Seiki Harada. These collaborations have fostered innovation and have been instrumental in the development of new technologies in the semiconductor field.

Conclusion

Masami Tomono's contributions to the field of discrete semiconductor devices highlight his role as an influential inventor. His patent and work at Hitachi, Ltd. demonstrate his commitment to advancing technology in this critical area.

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