Masami Shirosaki

Title: Masami Shirosaki: Innovator in Semiconductor Technology

Introduction

Masami Shirosaki is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His innovative approaches have paved the way for advancements in semiconductor devices.

Latest Patents

Masami Shirosaki's latest patents include a semiconductor device and a method for producing a semiconductor device. The first patent describes a semiconductor device comprising a cylindrical storage node. In this design, the surface area of the storage node is increased by forming silicone grains in an amorphous silicone film through heat treatment applied only to the outer wall of the cylindrical portion. This process creates a roughened surface on the outer wall while maintaining the physical strength of the cylindrical portion by leaving the inner wall untreated. This innovation prevents destruction and breakage of the cylindrical portion. The second patent also focuses on a semiconductor device with a stacked capacitor structure, utilizing similar techniques to enhance the surface area and structural integrity of the storage node.

Career Highlights

Throughout his career, Masami Shirosaki has worked with notable companies such as Renesas Technology Corporation and Mitsubishi Electric Corporation. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.

Collaborations

Masami has collaborated with several talented individuals in his field, including Junichi Tsuchimoto and Kiyoshi Mori. Their collective efforts have further advanced the development of semiconductor technologies.

Conclusion

Masami Shirosaki's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His work continues to impact the industry positively, showcasing the importance of innovation in technology.