Masami Ohta

Title: Masami Ohta: Innovator in Polishing Technology

Introduction

Masami Ohta is a distinguished inventor based in Moriyama, Japan. With a focus on advancements in polishing technology, Ohta has made significant contributions to the field, particularly through her patented inventions.

Latest Patents

Ohta holds a patent for a polishing pad, along with a method and apparatus for polishing. This innovative polishing pad features a mechanism designed to supply water to the polishing surface in contact with the item being polished. Specifically, the mechanism comprises a domain structure with an area of 1×10^(-6) or smaller. This unique design minimizes scratch generation and dust adhesion on the polished surface while enhancing the polishing rate at low dishing and erosion. As a result, Ohta's invention holds great potential for the surface polishing of semiconductor thin films.

Career Highlights

Masami Ohta works at Toray Industries, Inc., where she continues to develop groundbreaking technologies. Her expertise and innovative mindset have positioned her as a valuable asset to her company and the industry at large.

Collaborations

Throughout her career, Ohta has collaborated with other talented individuals in her field, including Masaaki Shimagaki and Hisashi Minamiguchi. These partnerships have enabled her to further refine her inventions and contribute to various projects within the technology landscape.

Conclusion

Masami Ohta's pioneering work in polishing technologies highlights her commitment to innovation and excellence. With her patented polishing pad and collaborative spirit, she plays a vital role in advancing the efficiency and effectiveness of semiconductor surface polishing processes. Her contributions not only enhance industry standards but also pave the way for future advancements in technology.