Fujisawa, Japan

Masami Ishikawa

This inventor holds 1 USPTO granted patent. Top assignee: Ebara-Udylite Co., Ltd.. Active years: 2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masami Ishikawa. Retrieved from https://idiyas.com/inventor/masami-ishikawa-it8hzr22

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: Masami Ishikawa: A Pioneer in Via-Filling Process Innovation

Introduction

Masami Ishikawa is an inventive mind based in Fujisawa, Japan, renowned for her contributions to the field of innovative processes. With a patent to her name, she has made significant strides in technological advancement, particularly in manufacturing.

Latest Patents

Masami's most notable patent is the "Via-filling process," which reflects her expertise and commitment to enhancing industrial techniques. This innovative process plays a crucial role in various applications, showcasing her ability to address complex challenges in the manufacturing sector.

Career Highlights

Currently, Masami is employed at Ebara-udylite Co., Ltd., where she applies her skills and knowledge to drive innovation forward. Her single patent exemplifies her focus on quality and efficiency, marking her as a significant contributor to her company's success.

Collaborations

Throughout her career, Masami has collaborated with talented professionals such as Hideki Hagiwara and Ryoichi Kimizuka. These partnerships have fostered a creative environment that enables the development of groundbreaking technologies and processes.

Conclusion

Masami Ishikawa stands out as a remarkable inventor whose work is paving the way for future innovations in the industry. Her achievements in the via-filling process exemplify the impact that dedicated professionals can have in advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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