Osaka, Japan

Masako Maeda


Average Co-Inventor Count = 4.1

ph-index = 4

Forward Citations = 110(Granted Patents)


Company Filing History:


Years Active: 1994-1997

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6 patents (USPTO):Explore Patents

Title: The Innovations of Masako Maeda: A Pioneer in Photoresist Technology

Introduction

Masako Maeda is an esteemed inventor based in Osaka, Japan, recognized for his significant contributions to the field of photoresist technology. With a remarkable portfolio of six patents, Maeda's innovations have been instrumental in advancing the capabilities of photoresist materials used in various applications, particularly in the semiconductor industry.

Latest Patents

Among Masako Maeda's latest inventions is a heat-resistant photoresist composition that features a negative-type pattern. This innovative composition incorporates a resin component comprising a carbodiimide unit, along with a compound that induces a basic compound upon exposure to actinic rays. The photosensitive layer created from this photoresist composition exhibits exceptional sensitivity, even with lower irradiation energy, allowing for the production of sharp negative-type patterns when exposed to actinic rays, such as ultraviolet rays.

Career Highlights

Masako Maeda has dedicated his career to developing cutting-edge materials that enhance the precision and effectiveness of photoresist applications. His expertise and innovative approach have not only contributed to the advancement of the industry but also helped position his employer, Nitto Denko Corporation, as a leader in the development of advanced materials for semiconductor production.

Collaborations

Collaboration plays a crucial role in Masako Maeda's inventive process. He has worked alongside talented colleagues, including Amane Mochizuki and Kazumi Higashi, both of whom have contributed their expertise to drive innovation within their projects. The synergy among this team has paved the way for inventive breakthroughs in the field.

Conclusion

Masako Maeda's work exemplifies the spirit of innovation in the realm of photoresist technology. His latest patents reflect a commitment to excellence and a drive to enhance the functionality of photoresist compositions. As he continues to collaborate with talented researchers and colleagues at Nitto Denko Corporation, Maeda remains a vital contributor to the evolution of materials supporting the semiconductor industry, ensuring that advancements in technology continue to flourish.

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