Company Filing History:
Years Active: 1993
Title: **Innovative Contributions of Masako Iizuka in Semiconductor Manufacturing**
Introduction
Masako Iizuka, an esteemed inventor based in Kawasaki, Japan, has made significant strides in the field of semiconductor manufacturing. With her unique approach to fabricating semiconductor devices, she holds a patent that emphasizes efficiency and precision in production processes.
Latest Patents
Masako Iizuka is credited with a noteworthy patent titled "Method of Manufacturing Semiconductor Devices." This innovation focuses on producing semiconductor devices with small diameter via-holes, specifically not exceeding 0.6 microns, for multilayer interconnections. Her patented method involves covering an interlayer film and via-holes with a continuous first metal film through a chemical vapor deposition (CVD) process. Following this, she utilizes an energy beam to heat and melt a second metal film deposited on the first one using a physical vapor deposition (PVD) process. This method allows for the effective filling of the via-holes, consequently forming conductive plugs that enhance the functionality of semiconductor devices. Moreover, the deposition of the second metal film and filling of the via-holes can be conducted simultaneously using a high-temperature sputtering process.
Career Highlights
Masako Iizuka's career is highlighted by her dedication to advancing semiconductor technology. While she is currently associated with Fujitsu Corporation, her expertise in semiconductor manufacturing processes has set her apart in the industry. Over the years, she has contributed immensely to the development of new techniques that improve production quality and efficiency.
Collaborations
Iizuka has worked alongside skilled professionals such as Ryoichi Mukai and Motoo Nakano, further enriching her experience and knowledge in the semiconductor field. These collaborations have not only benefited her career but have also contributed to the advancements made by Fujitsu Corporation in semiconductor technology.
Conclusion
Masako Iizuka's work exemplifies the innovation and ingenuity present in the semiconductor manufacturing sector. Through her patented method, she has paved the way for more efficient manufacturing processes, showcasing the impact that skilled inventors can have on technological advancement. Her contributions continue to influence the field, making her a prominent figure in the world of patents and inventions.