Masaki Uchikura

Title: Masaki Uchikura: Innovator in Semiconductor and Gas Separation Technologies

Introduction

Masaki Uchikura is a notable inventor based in Sagamihara, Japan. He has made significant contributions to the fields of semiconductor technology and gas separation. With a total of 3 patents to his name, Uchikura's work has had a meaningful impact on various industries.

Latest Patents

Uchikura's latest patents include a protective dust cover for photomasks or reticles. This invention is a transparent thin film cover designed to protect the substrate surface of photomasks or reticles used in semiconductor integrated circuits. The cover is positioned at a certain distance from the substrate surface to ensure effective dust protection. The material consists primarily of a polyvinyl acetal with specific chemical properties.

Another significant patent involves a membrane for selectively separating gases. This membrane exhibits high permeability for oxygen and is capable of extracting and concentrating oxygen from mixed gases, particularly from the air. It is produced from a novel poly(disubstituted acetylene)/polyorganosiloxane graft copolymer, which enhances its performance in gas separation applications.

Career Highlights

Throughout his career, Uchikura has worked with prominent companies such as Tosoh Corporation and Sagami Chemical Research Center. His experience in these organizations has allowed him to develop innovative solutions that address complex challenges in technology and materials science.

Collaborations

Uchikura has collaborated with notable colleagues, including Kiyohide Matsui and Yu Nagase. These partnerships have contributed to the advancement of his research and the successful development of his inventions.

Conclusion

Masaki Uchikura is a distinguished inventor whose work in semiconductor technology and gas separation has led to valuable innovations. His patents reflect a commitment to advancing technology and improving industrial processes.