Masaki Tokunaga

Title: Masaki Tokunaga: Innovator in Semiconductor Manufacturing

Introduction

Masaki Tokunaga is a prominent inventor based in Tama, Japan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 3 patents. His innovative approaches have advanced the techniques used in the production of semiconductor devices.

Latest Patents

Tokunaga's latest patents include a method for manufacturing semiconductor devices using helium-containing gas. This method involves forming a silicon nitride (SiN) film on a substrate, followed by plasma treatment with a He-containing gas. Another notable patent is for a method of subatmospheric plasma-enhanced atomic layer deposition (ALD) using capacitively coupled electrodes with a narrow gap. This technique allows for the deposition of films under specific pressure conditions and involves a series of controlled steps to ensure optimal results.

Career Highlights

Masaki Tokunaga is currently associated with Asm IP Holding B.V., where he continues to push the boundaries of semiconductor technology. His work has been instrumental in developing methods that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Throughout his career, Tokunaga has collaborated with notable colleagues, including Atsuki Fukazawa and Masaru Zaitsu. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Masaki Tokunaga's contributions to semiconductor manufacturing highlight his role as a leading inventor in the field. His patents reflect a commitment to advancing technology and improving manufacturing processes.