Masaki Kitazaki

Title: Masaki Kitazaki: Innovator in Tungsten Film Technology

Introduction

Masaki Kitazaki is a notable inventor based in Narita, Japan. He has made significant contributions to the field of chemical vapor deposition processes, particularly in the formation of tungsten films. His innovative methods have implications for various applications in semiconductor manufacturing.

Latest Patents

Masaki Kitazaki holds a patent for a method of reducing stress in blanket tungsten film formed by a chemical vapor deposition process. This patent describes a technique for forming a blanket tungsten film by CVD process. Before forming a nucleus for a blanket tungsten film, a mixture gas of WF gas, SiH gas, and H gas is supplied into a vacuum chamber. Preprocessing is carried out for several seconds while regulating the respective flows of gases, ensuring that SiH gas is in excess relative to WF gas. The WF gas/SiH gas flow ratio is maintained within the range of 0.15 to 0.35, with a processing time set between 2 to 10 seconds. Following this preprocessing, nucleation occurs to form a blanket tungsten film, which minimizes film stress even when created in a lower-temperature environment. He has 1 patent to his name.

Career Highlights

Masaki Kitazaki is currently employed at Applied Materials, Inc., a leading company in the field of materials engineering. His work focuses on advancing technologies that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Masaki Kitazaki collaborates with Keiichi Tanaka, a fellow innovator in the field. Their combined expertise contributes to the development of cutting-edge technologies in the semiconductor industry.

Conclusion

Masaki Kitazaki's contributions to the field of tungsten film technology through his innovative patent demonstrate his commitment to advancing semiconductor manufacturing processes. His work continues to influence the industry positively.