This inventor holds 1 USPTO granted patent. Top assignee: Mitsubishi Gas Chemical Company, Inc.. Active years: 2002.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2002
Title: Masaki Fujihira: Innovator in Semiconductor Technology
Introduction
Masaki Fujihira is a prominent inventor based in Tokyo, Japan. He is known for his significant contributions to the field of semiconductor technology. His innovative approach has led to advancements in the production of electronic parts.
Latest Patents
Fujihira holds a patent for a process for the production of electronic parts. This method involves supporting a semiconductor substrate during high-temperature processing, specifically at temperatures of 350°C or higher. The patent outlines a detailed process that includes forming semiconductor circuits on one surface of a semiconductor substrate, grinding and polishing the other surface, and ultimately obtaining an electronic-circuits-possessing semiconductor substrate.
Career Highlights
Masaki Fujihira is associated with Mitsubishi Gas Chemical Company, Inc., where he has made notable contributions to the development of semiconductor technologies. His work has been instrumental in enhancing the efficiency and effectiveness of electronic part production.
Collaborations
Fujihira has collaborated with esteemed colleagues such as Kazuyuki Ohya and Kazuhiro Otsu. These partnerships have fostered innovation and have played a crucial role in advancing their shared goals in semiconductor research.
Conclusion
Masaki Fujihira's work in semiconductor technology exemplifies the spirit of innovation. His contributions continue to impact the industry positively, paving the way for future advancements in electronic components.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile