Toyama, Japan

Masahiro Tatta

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi-Kokusai Electric Inc.. Active years: 2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masahiro Tatta. Retrieved from https://idiyas.com/inventor/masahiro-tatta

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 462(Granted Patents)


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: Masahiro Tatta: Innovator in Substrate Processing Technology

Introduction

Masahiro Tatta is a notable inventor based in Toyama, Japan. He has made significant contributions to the field of substrate processing technology. His innovative work has led to the development of a unique patent that enhances the efficiency of substrate processing.

Latest Patents

Masahiro Tatta holds a patent for a "Substrate processing apparatus and attaching/detaching method of reaction vessel." This invention provides a substrate processing apparatus that includes a reaction vessel with a processing chamber for substrate processing. It features a heating device that heats the substrate from the outer peripheral side of the reaction vessel. Additionally, it has a lid member that closes the processing chamber and an attachment/detachment jig for managing the reaction vessel's connection to the heating device. The design also incorporates a support section that aids in the attachment and detachment process.

Career Highlights

Masahiro Tatta is currently employed at Hitachi Kokusai Electric Inc., where he continues to innovate in the field of substrate processing. His work has been instrumental in advancing the technology used in various applications.

Collaborations

Masahiro Tatta collaborates with Koji Shibata, contributing to the development of innovative solutions in their field.

Conclusion

Masahiro Tatta's contributions to substrate processing technology exemplify the impact of innovation in modern engineering. His patent reflects a commitment to enhancing efficiency and functionality in substrate processing systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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