Kyoto, Japan

Masahiro Tanii

This inventor holds 1 USPTO granted patent. Top assignee: Nissin Ion Equipment Co., Ltd.. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masahiro Tanii. Retrieved from https://idiyas.com/inventor/masahiro-tanii

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: **Masahiro Tanii: Innovator in Plasma Generation Technology**

Introduction

Masahiro Tanii is a distinguished inventor based in Kyoto, Japan. He has made significant contributions to the field of plasma technology, particularly through his innovative designs aimed at enhancing plasma generation processes.

Latest Patents

Masahiro Tanii holds a patent for a "Bucket-type ion source for fanning cusped magnetic fields inside a plasma generation chamber." This advanced ion source encompasses a plasma generation chamber, multiple filaments, and electrodes engineered to extract an ion beam. Additionally, it features a set of permanent magnets that create cusped magnetic fields within the chamber, along with a deposition preventive plate designed to mitigate unwanted material build-up.

Career Highlights

Tanii's professional journey is marked by his tenure at Nissin Ion Equipment Co., Ltd., where he has played a pivotal role in advancing technologies related to ion sources and plasma equipment. His work is vital for various applications, including semiconductor manufacturing and materials processing.

Collaborations

Throughout his career, Masahiro Tanii has collaborated with noteworthy coworkers such as Yutaka Inouchi and Takeshi Matsumoto. Their joint efforts have been integral in refining technologies and achieving breakthroughs in the field of plasma generation.

Conclusion

Masahiro Tanii's innovative approach to ion source technology has positioned him as a key figure in the plasma generation sector. His singular patent demonstrates not just technical expertise but also a commitment to pushing the boundaries of technology for industrial applications. His contributions continue to resonate within the research community and industry alike.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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