The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2013
Filed:
Mar. 09, 2012
Yutaka Inouchi, Kyoto, JP;
Takeshi Matsumoto, Kyoto, JP;
Masahiro Tanii, Kyoto, JP;
Katsuharu Imai, Kyoto, JP;
Yutaka Inouchi, Kyoto, JP;
Takeshi Matsumoto, Kyoto, JP;
Masahiro Tanii, Kyoto, JP;
Katsuharu Imai, Kyoto, JP;
Nissin Ion Equipment Co., Ltd., Kyoto, JP;
Abstract
An ion source includes a plasma generation chamber, at least one filament disposed inside the plasma generation chamber, at least one electrode disposed so as to be opposed to the plasma generation chamber, and configured to extract out an ion beam from the plasma generation chamber, and a plurality of permanent magnets disposed outside the plasma generation chamber, and configured to form cusped magnetic fields inside the plasma generation chamber, and a deposition preventive plate disposed parallel with an inner surface of a wall of the plasma generation chamber. The deposition preventive plate has recesses which are formed at such positions as to be opposed to the respective permanent magnets with the wall of the plasma generation chamber interposed in between.