Masahiro Tadokoro

Title: The Innovations of Masahiro Tadokoro

Introduction

Masahiro Tadokoro is a prominent inventor based in Miyagi, Japan. He has made significant contributions to the field of substrate processing and etching methods. With a total of 2 patents to his name, his work has had a notable impact on the industry.

Latest Patents

Tadokoro's latest patents include a substrate and substrate processing method. This substrate features an etching target film and a first film made of a material with a lower etching rate. The first film contains multiple first openings and a second opening, designed to enhance the etching process. His second patent focuses on an etching method and plasma processing apparatus, which maintains a target object temperature within a specific range. This method involves precise calculations of gas flow rates and atom counts to achieve optimal etching conditions.

Career Highlights

Masahiro Tadokoro works at Tokyo Electron Limited, a leading company in the semiconductor manufacturing industry. His expertise in substrate processing has positioned him as a key figure in advancing technology in this field.

Collaborations

Tadokoro collaborates with talented coworkers, including Masahiro Tabata and Taku Gohira. Their combined efforts contribute to innovative solutions and advancements in their projects.

Conclusion

Masahiro Tadokoro's contributions to substrate processing and etching methods demonstrate his commitment to innovation in technology. His patents reflect a deep understanding of the complexities involved in these processes.